Can China Build a Complete EUV Machine Without ASML?

China is advancing in EUV light source technology but faces major challenges in developing a complete EUV lithography machine. Key hurdles include producing high-quality optical components, durable pellicles, and sensitive photoresists. Significant investments, collaborations, and innovations are crucial for China to attain independence in semiconductor manufacturing within this complex field.

China’s recent advancements in EUV light source technology, led by Lin Nan, have showcased significant progress in the semiconductor field. However, constructing a full-fledged EUV lithography machine encompasses more than just the light source. Let’s explore the critical components and the hurdles China must overcome.

Advanced Optics: The ZEISS Factor

EUV lithography relies on intricate optical systems to project circuit patterns onto wafers. ZEISS, a German company, is the sole provider of the ultra-precise mirrors and lenses required for EUV systems. These optics are essential for achieving the nanometer-scale resolutions necessary for modern chips. Currently, China lacks domestic capabilities to produce optics of comparable quality and precision.

Photomasks and Pellicles: Ensuring Pattern Integrity

Photomasks carry the circuit patterns that are transferred onto wafers. In EUV lithography, these masks must be defect-free and are protected by pellicles—thin membranes that shield them from contaminants. Developing durable pellicles that can withstand EUV’s high-energy light without degrading is a significant challenge. China is still in the process of developing reliable pellicle technology suitable for EUV applications.

Photoresists: Capturing the Circuit Patterns

Photoresists are light-sensitive materials applied to wafers to form the desired circuit patterns. EUV lithography demands photoresists with high sensitivity and resolution. While China has made strides in developing photoresists, achieving the performance levels required for EUV remains a work in progress.

System Integration and Environmental Control

Integrating all these components into a cohesive and functional EUV lithography system is a monumental task. The entire process must occur in a vacuum environment to prevent EUV light absorption by air. Maintaining such conditions and ensuring the synchronization of all components require advanced engineering and manufacturing capabilities.

Road Ahead

While China’s progress in EUV light source technology is commendable, building a complete EUV lithography machine involves overcoming significant challenges in optics, photomasks, photoresists, and system integration. Collaborations, technological breakthroughs, and substantial investments will be essential for China to achieve self-reliance in this critical area of semiconductor manufacturing.